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[Total No. of Questions: 08]
Roll No. : .................................
[Total No. of Pages: 01]
M.TECH FIRST SEMESTER EXAMINATION, APRIL - 2021
[Offline mode open book system]
Course: NANOTECHNOLOGY
Paper Code: MNT-102
Synthesis of Nanomaterials
Maximum Marks: 70
Minimum Marks: 28
Time: 3 hrs.
NOTE: Attempt any five questions, each question carries equal marks.
1.
Discuss the theory and application of the Physical Vapor Deposition method in detail. Also explain the difference between PVD and CVD coatings?
2.
Explain the basic principle and operation of sputtering. Also describe different types of sputtering.
3.
Explain the Sol-Gel method for synthesis of nanomaterials with an example. Also discuss its advantages and disadvantages.
4.
What is the role of photoresist in lithography? Describe Photo lithography with schematic diagram.
5.
Discuss self-assembly technique for nanomaterial synthesis. Also explain its area of application.
6.
Write a brief note on Dip-pen Nanolithography.
7.
Discuss metallic glasses and its applications. What is glass transition temperature and factors affecting glass transition temperature.
8.
Write a short note on any three of the following:
a.
Electrodeposition techniques.
b.
Nucleation and Growth.
c.
Micro emulsions or reverse micelles.
d.
Pulsed laser Ablation.
e.
Chalcogenide glasses.